Low Vacuum Carbon Coating: Ideal for sample observation in Normal SEM or analysis like EDS, offering clear structure observation at magnifications of x25,000 or higher.

Precise Deposition Monitoring: Carbon deposition is closely monitored, including input voltage and current.

Dual Carbon Sources: Two Carbon Sources enable deposition for thicker films.

Pulse Mode for Uniform Coating: Carbon deposition can be performed in Pulse mode by adjusting the heating time, ensuring even coating and minimal heat damage.

Default Film Thickness Control: Film Thickness control is included by default, allowing you to achieve your desired film thickness effortlessly.